EUV lithography: technology for the semiconductor industry in 2010

EUV Lithography—The Successor to Optical Lithography?

This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the...

Approach to EUV Lithography Simulation

investigating the integration of translation technologies into translation programs in iranian universities: basis for a syllabus design in translation technology

today, information technology and computers are indispensable tools of any profession and translation technologies have become an indispensable part of translator’s workstation. with the increasing demands for high productivity and speed as well as consistency and with the rise of new demands for translation and localization, it is necessary for translators to be familiar with market demands an...

Advances in computer simulations of LPP sources for EUV Lithography

Photon sources for extreme ultraviolet Lithography (EUVL) are still challenging problem to achieve high volume manufacture in the semiconductor industry. Currently EUVL community narrowed the research and developments to two directions: discharge produced plasma (DPP) assisted with trigger lasers and dual-pulse laser produced plasma (LPP) with mass-limited targets. Such complicated systems requ...

Longer Wavelength EUV Lithography (LW-EUVL)

Extreme UV Lithography (EUVL) is generally accepted as the leading candidate for next generation lithography. Several challenges remain for EUVL, especially as its insertion point is pushed to finer resolution. Although diffractive scaling may suggest a transition to shorter EUVL wavelengths, several issues arise that would make that difficult. Challenges involve issues such as flare, multilaye...